Hexamethyldisilazane (HMDS) CAS 999-97-3
Hexamethyldisilazane (HMDS) is a volatile organosilicon reagent commonly used as a silylating agent, surface treatment reagent and precursor in semiconductor and thin-film deposition processes. It functions to introduce trimethylsilyl protecting groups in organic synthesis, to render surfaces hydrophobic (silicon wafer priming) and as a molecular precursor for silicon-containing films. HMDS is handled as a flammable, moisture-sensitive chemical and should be used with appropriate engineering controls.
Applications
-
Silylation reagent
HMDS is used to introduce trimethylsilyl (TMS) protecting groups on hydroxyl and amino functionalities in organic synthesis and analytical derivatization. -
Semiconductor wafer priming
HMDS is applied as a surface primer to render silicon wafer surfaces hydrophobic and improve photoresist adhesion in lithography. -
CVD / precursor for silicon-containing films
Employed as a molecular precursor or additive in chemical vapor deposition routes for silicon-carbonitride and related thin films. -
Surface treatment and adhesion promotion
Used to modify surface energy of substrates (glass, silica, oxides) prior to coating or bonding operations. -
Analytical derivatization
Used to derivatize polar analytes (e.g., in GC sample prep) to improve volatility and chromatographic behavior. -
Specialty synthesis and organosilicon chemistry
Applied as a reagent and intermediate in production of silyl derivatives and silazane chemistry.
